Exposure apparatus and method for producing device
US7589820B2 · kind B2 · utility
44Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2006 |
| Grant date | Sep 15, 2009 |
| Priority date | — |
| Expiry date | Jun 23, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.