Plasma generation and processing with multiple radiation sources
US7592564B2 · kind B2 · utility
8Cited by
186References
55Claims
0Family size
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Key dates
| Filing date | Oct 31, 2006 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | Dec 27, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another radiation source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.