Resist composition and patterning process
US7598016B2 · kind B2 · utility
59Cited by
8References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2008 |
| Grant date | Oct 6, 2009 |
| Priority date | — |
| Expiry date | Mar 21, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/121
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing a carboxylic acid ammonium salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.