Methods for plasma diagnostics and the measurement of thin films
US7599058B2 · kind B2 · utility
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17Claims
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Key dates
| Filing date | Dec 24, 2007 |
| Grant date | Oct 6, 2009 |
| Priority date | — |
| Expiry date | Dec 24, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8411
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods for obtaining and analyzing data from a spectral source is provided. The method includes identifying an environment that is capable of generating spectral information, and obtaining the generated spectral information from the environment. The method further includes splitting the generated spectral information into a plurality of spectral data units. The spectral data units are further captured in separate storage entities and separately processed in parallel in order to produce a complete processing and quantification of the environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.