Charged particle beam writing method and apparatus
US7601968B2 · kind B2 · utility
13Cited by
5References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 24, 2006 |
| Grant date | Oct 13, 2009 |
| Priority date | — |
| Expiry date | Aug 18, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30472
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam writing method includes irradiating a shot of a charged particle beam, and deflecting the charged particle beam of the shot using a plurality of deflectors arranged on an optical path of the charged particle beam to write a pattern on a target object, wherein any one of the plurality of deflectors controls deflection of a charged particle beam of a shot different from a shot which is controlled in deflection by another deflector in the same period.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.