Method for selecting optical configuration for high-precision scatterometric measurement
US7602509B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2008 |
| Grant date | Oct 13, 2009 |
| Priority date | — |
| Expiry date | Mar 18, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present application discloses a method for selecting an optical configuration for a high-precision scatterometric measurement. A geometric parameterization of a grating is determined, wherein the grating comprises a periodic structure. The geometric parameterization is used to generate a representative set of model structures. An eigenvalue method is utilized to compute, for each model structure, a set of solutions which satisfy a Rayleigh condition within the grating. The Raleigh condition within the grating is satisfied when a vertical component of a propagating mode within the grating is zero. Other embodiments, features and aspects are also disclosed herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.