Film formation apparatus and method of using the same
US7604010B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 24, 2005 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Oct 19, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction chamber a by-product film derived from a film formation gas. The concentration measuring section is disposed in an exhaust system to monitor concentration of a predetermined component contained in exhaust gas from the reaction chamber. The information processor is configured to compare a measurement value obtained by the concentration measuring section with a preset value and to thereby determine an end point of the cleaning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.