Substrate processing apparatus
US7604424B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 22, 2006 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Jan 24, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.