Programmable photolithographic mask based on semiconductor nano-particle optical modulators
US7605390B2 · kind B2 · utility
3Cited by
12References
2Claims
0Family size
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Key dates
| Filing date | Dec 9, 2003 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Dec 9, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24893
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.