Patent · US Active

Optical system, method of manufacturing an optical system and method of manufacturing an optical element

US7605926B1 · kind B1 · utility

20Cited by

9References

6Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Jochen Hetzler · Aalen, DE
Ralf Arnold · Aalen, DE
Frank Schillke · Aalen, DE
Bernd Doerband · Aalen, DE

Key dates

Filing date	Aug 22, 2008
Grant date	Oct 20, 2009
Priority date	—
Expiry date	Aug 22, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG01M11/0271
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.