Plasma reaction chamber with a built-in magnetic core
US7611585B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 19, 2004 |
| Grant date | Nov 3, 2009 |
| Priority date | — |
| Expiry date | Jan 17, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3266
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma reaction chamber includes a chamber housing having two inner connection passages for connecting two vacuum chambers to other vacuum chambers. Two vacuum chambers and two inner connection passages form a continuous discharge path. At least one magnetic core is mounted in two vacuum chambers or two inner connection passages, and a coil connected to a power source is wounded around the magnetic core so as to transfer induced electromotive force to the continuous discharge path. The plasma reaction chamber is configured so that at least two vacuum chambers are integrated in a multiple arrangement, and common parts are shared in common, so that at least two substrates may be treated in parallel at the same time, thereby improving productivity per unit area and making it possible to construct a low-cost and high-efficient substrate treatment system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.