Lithographic apparatus, contaminant trap, and device manufacturing method
US7612353B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 2006 |
| Grant date | Nov 3, 2009 |
| Priority date | — |
| Expiry date | Nov 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.