Sampling feedback system
US7615747B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 1, 2007 |
| Grant date | Nov 10, 2009 |
| Priority date | — |
| Expiry date | Jul 22, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron microscope includes an electron beam source, which produces an electron beam. Scan deflectors direct the electron beam in a pattern across a sample, which thereby emits electrons. The pattern includes line portions and retrace portions. A main detector receives the electrons emitted by the sample, and produces a main signal. Blankers redirect the electron beam into a reference detector during at least a portion of the retrace portions of the pattern. The reference detector receives the electron beam and produces a reference signal. A mixing circuit receives the main signal and the reference signal and adjusts the main signal based at least in part on the reference signal, thereby producing an adjusted signal. An image computer receives the adjusted signal and produces an image of the sample based at least in part on the line portions of the adjusted signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.