Method of manufacturing photomask and method of repairing optical proximity correction
US7617475B2 · kind B2 · utility
9Cited by
3References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2006 |
| Grant date | Nov 10, 2009 |
| Priority date | — |
| Expiry date | Jan 31, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a photomask is described. The graphic data of the photomask are provided, and than an optical proximity correction is performed to the graphic data. A process rule check is then performed to the graphic data with the optical proximity correction. When at least one failed pattern not passing the process rule check is found in the graphic data, a repair procedure is performed only to the failed pattern so that the failed pattern can pass the process rule check. The patterns of the photomask are then formed according to the corrected and repaired graphic data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.