Method for pre-treating epitaxial layer, method for evaluating epitaxial layer, and apparatus for evaluating epitaxial layer
US7618833B2 · kind B2 · utility
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7References
10Claims
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Key dates
| Filing date | Nov 10, 2006 |
| Grant date | Nov 17, 2009 |
| Priority date | — |
| Expiry date | Jul 21, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for pre-treating an epitaxial layer performed before evaluation of the epitaxial layer by making the epitaxial layer contact with a metal electrode by a capacitance-voltage measurement, the method comprising; applying carbon-bearing compound to a surface of the epitaxial layer; subsequently irradiating ultraviolet light to the surface of the epitaxial layer; and thereby forming an oxide film on the surface of the epitaxial layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.