Positive resist composition and pattern forming method using the same
US7625690B2 · kind B2 · utility
16Cited by
4References
19Claims
0Family size
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Key dates
| Filing date | Mar 14, 2007 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Apr 11, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.