Kaoru Iwato
51Patents
6h-index
43Co-inventors
68Inventor score
Filing activity: Nov 30, 2001 → Aug 12, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7625690B2 | Positive resist composition and pattern forming method using the same | Emerging Cross-Sectional Technologies | 16 | Active |
| US9897922B2 | Method of forming pattern and developer for use in the method | Physics | 10 | Active |
| US8252877B2 | Polymerizable compound and polymer compound obtained by using the same | Chemistry; Metallurgy | 10 | Active |
| US8822129B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device | Emerging Cross-Sectional Technologies | 10 | Active |
| US7449573B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | Emerging Cross-Sectional Technologies | 10 | Expired |
| US9448482B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | Electricity | 7 | Active |
| US9417528B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Electricity | 5 | Active |
| US9291892B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition | Physics | 5 | Active |
| US6841330B2 | Planographic printing plate precursor | Performing Operations; Transporting | 4 | Expired |
| US7887988B2 | Positive resist composition and pattern forming method using the same | Emerging Cross-Sectional Technologies | 4 | Active |
| US8999622B2 | Pattern forming method, chemical amplification resist composition and resist film | Emerging Cross-Sectional Technologies | 3 | Active |
| US9250532B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Physics | 3 | Active |
| US8999621B2 | Pattern forming method, chemical amplification resist composition and resist film | Emerging Cross-Sectional Technologies | 3 | Active |
| US9718901B2 | Resin composition and pattern forming method using the same | Physics | 3 | Active |
| US8795944B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | Physics | 2 | Active |
| US8617788B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Physics | 2 | Active |
| US8158326B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US8802349B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US9709892B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Emerging Cross-Sectional Technologies | 1 | Active |
| US9097973B2 | Method of forming pattern and developer for use in the method | Physics | 1 | Active |
| US10248019B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film | Physics | 1 | Active |
| US9075310B2 | Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic device | Electricity | 1 | Active |
| US7160667B2 | Image forming material | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9760003B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | Emerging Cross-Sectional Technologies | 1 | Active |
| US9551935B2 | Pattern forming method and resist composition | Emerging Cross-Sectional Technologies | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.