Pattern inspection method and apparatus using linear predictive model-based image correction technique
US7627165B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 24, 2006 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jan 1, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T7/0004
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An image correction device for use in pattern inspection apparatus is disclosed. This device includes a pattern extraction unit for extracting a pattern, as a cut-and-paste pattern, from a pattern existence region of an inspection reference pattern image and a pattern image of a workpiece being tested. The device also includes a pattern pasting unit for pasting the cut-and-paste pattern in blank regions of the reference and under-test pattern images to thereby create a pasted reference pattern image and a pasted test pattern image. The device further includes an equation generator for generating by linear predictive modeling a set of simultaneous equations relative to the pasted reference and test pattern images, a parameter generator for solving these equations to obtain a model parameter(s), and a unit for creating a corrected pattern image by the linear predictive modeling using the model parameter(s).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.