Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
US7628865B2 · kind B2 · utility
51Cited by
2References
38Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 28, 2006 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | May 7, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/003
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
An embodiment of the invention provides a method to clean a surface. The method includes at least partly liberating contaminants from the surface with a contaminant liberating device, and capturing the contaminants that have been at least partly liberated with a contaminant removal device, the contaminant removal device generating at least one optical trap to trap the contaminants that have been at least partly liberated. Embodiments of the invention also provide a device manufacturing method, a method to clean a surface of an optical element, a cleaning assembly and cleaning apparatus, and a lithographic apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.