Low-expansion glass substrate for a reflective mask and reflective mask
US7629089B2 · kind B2 · utility
1Cited by
4References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 2006 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Oct 30, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70958
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.