Hitoshi Mishiro
10Patents
2h-index
17Co-inventors
51Inventor score
Filing activity: Mar 1, 2001 → Jun 1, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6475575B1 | Pellicle and method for manufacture thereof | Chemistry; Metallurgy | 12 | Expired |
| US6795170B2 | Structure for attaching a pellicle to a photo-mask | Physics | 6 | Expired |
| US6713200B2 | Pellicle and method of using the same | Emerging Cross-Sectional Technologies | 2 | Expired |
| US7629089B2 | Low-expansion glass substrate for a reflective mask and reflective mask | Physics | 1 | Active |
| US11644706B2 | Glass plate | Chemistry; Metallurgy | 0 | Active |
| US12054419B2 | Cover glass | Physics | 0 | Active |
| US7491475B2 | Photomask substrate made of synthetic quartz glass and photomask | Emerging Cross-Sectional Technologies | 0 | Active |
| US11339087B2 | Antiglare glass substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US10981827B2 | Antiglare glass substrate | Emerging Cross-Sectional Technologies | 0 | Active |
| US7665367B2 | Method and apparatus for measuring shape of heat treatment jig | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.