Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition
US7629107B2 · kind B2 · utility
2Cited by
2References
9Claims
0Family size
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Key dates
| Filing date | Sep 18, 2007 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Dec 5, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.