Akinori Shibuya
52Patents
5h-index
45Co-inventors
68Inventor score
Filing activity: May 28, 2002 → Aug 7, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6946956B2 | Locating system and method for determining positions of objects | Physics | 16 | Expired |
| US8841060B2 | Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device | Emerging Cross-Sectional Technologies | 8 | Active |
| US6878505B2 | Photosensitive composition | Emerging Cross-Sectional Technologies | 6 | Expired |
| US9523912B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | Chemistry; Metallurgy | 5 | Active |
| US9250519B2 | Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method | Physics | 5 | Active |
| US9291892B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition | Physics | 5 | Active |
| US7169529B2 | Compound, photosensitive composition, lithographic printing plate precursor, and method of forming image | Physics | 4 | Expired |
| US7955780B2 | Positive resist composition and pattern forming method using the same | Emerging Cross-Sectional Technologies | 3 | Active |
| US9081277B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition | Physics | 3 | Active |
| US8541160B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same | Physics | 3 | Active |
| US9551931B2 | Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device | Electricity | 3 | Active |
| US7794916B2 | Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US8557499B2 | Actinic-ray- or radiation-sensitive resin composition, compound and method of forming pattern using the composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US7629107B2 | Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US8617788B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | Physics | 2 | Active |
| US8846293B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition | Emerging Cross-Sectional Technologies | 2 | Active |
| US7648817B2 | Positive working resist composition and pattern forming method | Physics | 2 | Active |
| US10538627B2 | Polyimide precursor composition, photosensitive resin composition, cured film, method for producing cured film, a semiconductor device, and method for producing polyimide precursor composition | Electricity | 2 | Active |
| US8911930B2 | Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern | Physics | 2 | Active |
| US10450417B2 | Resin, composition, cured film, method for manufacturing cured film and semiconductor device | Electricity | 2 | Active |
| US7267925B2 | Photosensitive composition and novel compound used therefor | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7396634B2 | Photosensitive composition | Emerging Cross-Sectional Technologies | 1 | Expired |
| US9034558B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern | Emerging Cross-Sectional Technologies | 1 | Active |
| US9405197B2 | Pattern forming method, method for manufacturing electronic device, and electronic device | Electricity | 1 | Active |
| US10526448B2 | Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device | Chemistry; Metallurgy | 1 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.