Interferometric analysis method for the manufacture of nano-scale devices
US7630067B2 · kind B2 · utility
9Cited by
119References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 30, 2004 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Jul 15, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7049
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention features a method to determine relative spatial parameters between two coordinate systems, which may be a mold and a region of a substrate in which mold is employed to generate a pattern. The method includes sensing relative alignment between the two coordinate systems at multiple points and determines relative spatial parameters therebetween. The relative spatial parameters include a relative area and a relative shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.