Automated metrology recipe generation
US7631286B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2005 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Aug 22, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method, system and encoded computer instructions provide for automatic generation of a metrology recipe without referencing a wafer. The highly accurate metrology recipe provides for locating measurement locations corresponding to test features on the wafer and directing the metrology tool to the locations, by calculating coordinates for the measurement locations based on mask data, lithography tool data, CAD data and process data. The metrology recipe directs the metrology tool to within 10 microns of test features formed on the wafer. Criteria may be input to a data base to identify multiple existing recipes and the automatically generated recipe may be generated to replace each identified recipe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.