Dyed photoresists and methods and articles of manufacture comprising same
US7632630B2 · kind B2 · utility
16Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 2006 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | May 3, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. Preferred dye compounds are polymeric materials that include one or more chromophores such as anthracene and other polycyclic moieties that effectively absorb deep UV exposure radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.