Apparatus and methods for nanolithography using nanoscale optics
US7634162B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2006 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Feb 1, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S385/902
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems with a de-magnifying lens. A de-magnifying lens for use in a standard photolithography system includes a film having a top surface, a bottom surface and a plurality of cylindrical channels containing a dielectric material; and an array of carbon nanotubes penetrating the film through the plurality of cylindrical channels, wherein an image on the top surface of the film is converted into a de-magnified image on the bottom surface of the film by the carbon nanotubes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.