Reflectivity optimization for multilayer stacks
US7634389B2 · kind B2 · utility
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18Claims
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Key dates
| Filing date | Nov 21, 2003 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Aug 5, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/0012
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for obtaining an optimal reflectivity value for complex multilayer stacks is disclosed. Aspects of the present invention include generating a model of a multilayer stack and parameterizing each layer by a thickness and an index of refraction; allowing a user to input values for the parameters; calculating an extrema for a cost function of reflectivity R using the input parameter values; calculating sensitivity values S for the extrema points; and obtaining an optimal value by calculating a cost function R+S.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.