Patent · US Active

Dielectric apparatus and associated methods

US7635634B2 · kind B2 · utility

2Cited by

0References

20Claims

0Family size

Assignees

Infineon Technologies AG · DE
IMEC VZW · BE

Inventors

Chris Stapelmann · Portland, US
Gert Jaschke · Ergolding, DE
Armin Tilke · Beacon, US

Key dates

Filing date	Apr 16, 2007
Grant date	Dec 22, 2009
Priority date	—
Expiry date	Oct 30, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH10D30/60
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

In an embodiment of the invention, an amorphous phase dielectric material is selectively formed over a substrate. The amorphous phase dielectric material is then converted into a crystalline phase dielectric material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.