Die-to-database photomask defect detection using region data to modify inspection thresholds
US7639863B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 22, 2005 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Sep 27, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/06
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A pattern inspection apparatus, including an optical image acquiring unit that acquires optical image data of a target plate to be inspected, the target plate being formed as a pattern. The pattern inspection apparatus also includes a design image data generating unit that generates design image data based on a design pattern serving as a base of pattern formation of the target plate. The pattern inspection apparatus further includes a comparing unit that inputs region image data generated based on information of a region pattern which is input to the pattern inspection apparatus. The information of the region pattern represents a predetermined region and is formed in the same format as that of information of the design pattern. The comparing unit compares the optical image data with the design image data based on the region image data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.