Reflective photomask, method of fabricating the same, and reflective blank photomask
US7642017B2 · kind B2 · utility
3Cited by
1References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2007 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Jun 30, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31616
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The reflective photomask may include a substrate, a reflective layer formed on the substrate, an absorption pattern formed on the reflective layer and over a first portion of the substrate. A compensatory portion may be formed over at least a second portion of the substrate. The second portion is adjacent to the first portion, and the compensatory portion is thinner than the absorption pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.