Polymer, top coating layer, top coating composition and immersion lithography process using the same
US7642042B2 · kind B2 · utility
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48Claims
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Key dates
| Filing date | Oct 24, 2006 |
| Grant date | Jan 5, 2010 |
| Priority date | — |
| Expiry date | Dec 25, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2810/50
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.