Mitsuhiro Hata
17Patents
5h-index
14Co-inventors
55Inventor score
Filing activity: Oct 23, 2004 → Jul 25, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7361609B2 | Mask patterns for semiconductor device fabrication and related methods | Electricity | 22 | Expired |
| US7855038B2 | Mask patterns for semiconductor device fabrication and related methods and structures | Electricity | 20 | Active |
| US7384730B2 | Top coating composition for photoresist and method of forming photoresist pattern using same | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7314691B2 | Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device | Physics | 8 | Expired |
| US8048612B2 | Polymer and chemically amplified resist composition comprising the same | Emerging Cross-Sectional Technologies | 5 | Active |
| US9063414B2 | Photoresist composition | Physics | 3 | Active |
| US7604911B2 | Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device | Physics | 2 | Active |
| US8062829B2 | Chemically amplified resist composition and chemically amplified resist composition for immersion lithography | Emerging Cross-Sectional Technologies | 1 | Active |
| US7981985B2 | Polymer and chemically amplified resist composition comprising the same | Chemistry; Metallurgy | 1 | Active |
| US7361612B2 | Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same | Physics | 1 | Active |
| US8475999B2 | Compound and photoresist composition containing the same | Chemistry; Metallurgy | 1 | Active |
| US7985529B2 | Mask patterns including gel layers for semiconductor device fabrication | Physics | 0 | Active |
| US8476473B2 | Compound, method for preparing the compound and resist composition containing the compound | Chemistry; Metallurgy | 0 | Active |
| US7468235B2 | Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions | Emerging Cross-Sectional Technologies | 0 | Active |
| US7642042B2 | Polymer, top coating layer, top coating composition and immersion lithography process using the same | Chemistry; Metallurgy | 0 | Active |
| US8546059B2 | Photoresist composition | Physics | 0 | Active |
| US8900790B2 | Photoresist composition | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.