Patent · US Active

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

US7646004B2 · kind B2 · utility

1Cited by

7References

50Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Marco Wedowski · Aalen, DE
Markus Weiss · Aalen, DE
Stephan Müllender · Aalen, DE
Johann Trenkler · Trochtelfingen, DE
Hartmut Enkisch · Aalen, DE
Gisela Sipos · Oberkochen, DE
H.A. van Mierlo · Maassluis, NL
Michiel David Nijkerk · Amsterdam, NL
Fokko Pieter Wieringa · Leuven, BE

Key dates

Filing date	May 24, 2006
Grant date	Jan 12, 2010
Priority date	—
Expiry date	Aug 14, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG21K2201/067
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.