Negative photosensitive polyimide composition and method for forming image the same
US7648815B2 · kind B2 · utility
36Cited by
17References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2001 |
| Grant date | Jan 19, 2010 |
| Priority date | — |
| Expiry date | Oct 7, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/117
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light, The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.