Positive working resist composition and pattern forming method
US7648817B2 · kind B2 · utility
2Cited by
2References
5Claims
0Family size
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Key dates
| Filing date | Feb 26, 2008 |
| Grant date | Jan 19, 2010 |
| Priority date | — |
| Expiry date | Feb 29, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.