Programmable via structure and method of fabricating same

US7652278B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Kuan-Neng Chen · Hsinchu, TW
• Lia Krusin-Elbaum · Dobbs Ferry, US
• Chung H. Lam · Williston, US
• Albert M. Young · Fishkill, US

Key dates

• Filing date: Dec 19, 2006
• Grant date: Jan 26, 2010
• Expiry date: Feb 8, 2028

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10N70/884

Abstract

A programmable via structure is provided as well as a method of fabricating the same. The inventive programmable via a semiconductor substrate. An oxide layer such as a thermal oxide is located on a surface of the semiconductor substrate. A patterned heating material is located on a surface of the oxide layer. The inventive structure also includes a patterned dielectric material having a least one via filled with a phase change material (PCM). The patterned dielectric material including the PCM filled via is located on a surface of the patterned heating material. A patterned diffusion barrier is located on an exposed surface of said at least one via filled with the phase change material. The inventive structure also includes contact vias that extend through the patterned dielectric material. The contact vias are filled with a conductive material which also extends onto the upper surface of the patterned dielectric material. A conductive material which serves as the input of the device is located atop the patterned diffusion barrier that is located directly above the via that is filled with the phase change material.