Patent · US Active

Method for nanostructuring of the surface of a substrate

US7655578B2 · kind B2 · utility

0Cited by
6References
29Claims
0Family size

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Key dates

Filing dateJul 3, 2007
Grant dateFeb 2, 2010
Priority date
Expiry dateFeb 3, 2028

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/0154
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Under consideration here is a method for the production of periodic nanostructuring on one of the surfaces of a substrate (10), presenting a periodic network of dislocations, embedded within a crystalline area (4) located in the neighborhood of an interface (5) between the crystalline material surfaces of two components (1, 2) assembled by bonding to form the substrate (10). It comprises the following steps:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.