Phase change memory device and method of manufacturing the same
US7659162B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 8, 2008 |
| Grant date | Feb 9, 2010 |
| Priority date | — |
| Expiry date | Nov 2, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N70/8828
Abstract
A method of manufacturing a phase change memory device includes forming at least one active device on a substrate, forming a bottom electrode electrically connected to the at least one active device, forming a phase change material layer and a top electrode on the bottom electrode, forming a capping layer on an upper surface of the top electrode and on side surfaces of the top electrode and phase change material layer, removing a portion of the capping layer overlapping the upper surface of the top electrode to define capping layer sidewall portions, forming an interlayer insulation film on the capping layer sidewall portions and on the top electrode, removing a portion of the interlayer insulation film from the top electrode to form a contact hole through the interlayer insulation film, and forming a contact plug in the contact hole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.