Triaxial through-chip connection
US7659202B2 · kind B2 · utility
34Cited by
166References
22Claims
0Family size
Inventor
Key dates
| Filing date | Mar 30, 2007 |
| Grant date | Feb 9, 2010 |
| Priority date | — |
| Expiry date | Apr 4, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24174
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method performed on a wafer having multiple chips each including a doped semiconductor and substrate involves etching an annulus trench, metalizing an inner and an outer perimeter side wall of the annulus trench, etching a via trench into the wafer, making a length of the via trench electrically conductive, thinning a surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.