ALD apparatus and method
US7662233B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Jun 28, 2004 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Feb 19, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1004
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Improved apparatus and method for SMFD ALD include a method designed to enhance chemical utilization as well as an apparatus that implements lower conductance out of SMFD-ALD process chamber while maintaining full compatibility with standard wafer transport. Improved SMFD source apparatuses (700, 700′, 700″) and methods from volatile and non-volatile liquid and solid precursors are disclosed, e.g., a method for substantially controlling the vapor pressure of a chemical source (722) within a source space comprising: sensing the accumulation of the chemical on a sensing surface (711); and controlling the temperature of the chemical source depending on said sensed accumulation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.