Contamination monitoring and control techniques for use with an optical metrology instrument
US7663747B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 16, 2006 |
| Grant date | Feb 16, 2010 |
| Priority date | — |
| Expiry date | Jan 19, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/335
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.