Patent · US Active

System and method for contrast enhanced zone plate array lithography

US7666580B2 · kind B2 · utility

6Cited by

5References

3Claims

0Family size

Assignee

Massachusetts Institute of Technology · US

Inventors

Rajesh Menon · Boston, US
Henry I. Smith · Sudbury, US

Key dates

Filing date	Dec 17, 2008
Grant date	Feb 23, 2010
Priority date	—
Expiry date	Dec 17, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/091
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A lithography system is disclosed that includes an array of focusing elements for directing focused illumination toward a recording medium, and a reversible contrast-enhancement material disposed between the recording medium and the array of focusing elements.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.