Method for fabrication MEMS-resonator
US7666700B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 7, 2008 |
| Grant date | Feb 23, 2010 |
| Priority date | — |
| Expiry date | Aug 8, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2201/0271
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention is an etching mask used for fabricating of the MEMS resonator including an oscillator which both edges are fixed to a base substance and vibrates to a vibrating direction, and an electrode which is fixed to a base substance by vibration is impossible in parallel for the oscillator, and is placed every one or more at the both sides of the oscillator. The etching mask includes a mask pattern 36 for oscillators which covers an oscillator formation scheduled region 34 on a conductive film 30 formed all over a sacrificial film which covers a region of the principal surface except both edges of the oscillator, and a mask pattern 40 for electrodes which covers an electrode formation scheduled region 38 on a conductive film. The width about a vibrating direction of a mask pattern for oscillators and a mask pattern for electrodes is made the same, and a gap between a mask pattern for oscillators and a mask pattern for electrodes and a gap between adjoining mask patterns for electrodes are made the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.