Prediction model and prediction method for exposure dose
US7669171B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2007 |
| Grant date | Feb 23, 2010 |
| Priority date | — |
| Expiry date | Jun 19, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0 represents a preset exposure dose of a process control system, and EC represents an exposure dose compensation value, andEC=[(MTTdiff/X)/(CDmask/X)]×(ES/A′)×(Wlast+Wavg),wherein MTTdiff represents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmask represents the actual critical dimension of the mask, X represents the magnification of the mask, ES represents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wlast represents the last batch of weights and Wavg represents an average weight, and CDmask, ES, A′, Wlast and Wavg are set parameters built into the process control system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.