Patent · US Active

Spacer forming method and spacer forming apparatus

US7671962B2 · kind B2 · utility

0Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 18, 2005
Grant dateMar 2, 2010
Priority date
Expiry dateMar 25, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F2203/69
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Providing a spacer forming method by which spacers can be securely formed in a predetermined region on a substrate. Ink containing granular spacers is jetted onto a crossing portion of a black matrix 5 in the shape of a lattice. Red pixel R, green pixel G and blue pixel B are formed in the openings of the lattice. The spacer containing ink is jetted onto the spacer forming positions from the nozzle by the ink jetting method. Plural drops of ink 7 are jetted onto each of the spacer forming positions on one of the opposite substrates E. The gap between the opposite substrates E can be securely maintained at a constant for filling with liquid crystal.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.