Scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts
US7671978B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2007 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Apr 16, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8874
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A scatterometer-interferometer and method for detecting and distinguishing characteristics of surface artifacts provides improved artifact detection and increased scanning speed in interferometric measurement systems. A scatterometer and interferometer are combined in a single measurement head and may have overlapping, concentric or separate measurement spots. Interferometric sampling of a surface under measurement may be initiated in response to detection of a surface artifact by the scatterometer, so that continuous scanning of the surface under measurement can be performed until further information about the size and/or height of the artifact is needed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.