Multi-laser system
US7672344B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 4, 2008 |
| Grant date | Mar 2, 2010 |
| Priority date | — |
| Expiry date | Apr 15, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/082
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A multi-laser system including a first laser oscillator for emitting a first laser beam, a second laser oscillator for emitting a second laser beam, a first scanner pair for receiving the first laser beam emitted by the first laser oscillator and deflecting the incident first laser beam to a desired location on a substrate to be processed, a second scanner pair for receiving the second laser beam emitted by the second laser oscillator and deflecting the incident second laser beam to a desired location on the substrate to be processed, and a scan lens for receiving laser beams that have been deflected from the first and second scanner pairs, focusing the received laser beams to spots having predetermined diameters so as to radiate the spots on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.