Patent · US Active

System for modifying small structures using localized charge transfer mechanism to remove or deposit material

US7674706B2 · kind B2 · utility

8Cited by

13References

25Claims

0Family size

Assignee

FEI Company · US

Inventors

George Y. Gu · Andover, US
Neil J. Bassom · Hamilton, US
Thomas J. Gannon · Ipswich, US
Kun Liu · Portland, US

Key dates

Filing date	Mar 16, 2005
Grant date	Mar 9, 2010
Priority date	—
Expiry date	Jul 4, 2026

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/76892
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.