Method of manufacturing high sensitivity spin valve designs with ion beam treatment
US7676904B2 · kind B2 · utility
11Cited by
8References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2004 |
| Grant date | Mar 16, 2010 |
| Priority date | — |
| Expiry date | Oct 13, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1107
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.